Aluminium Deposition from Tetrahydrofuran Solutions of AlCl3‐LiAlH4 using Microelectrodes. Part 1. 1:1 AlCl3‐LiAlH4.

@inproceedings{Howarth1987AluminiumDF,
  title={Aluminium Deposition from Tetrahydrofuran Solutions of AlCl3‐LiAlH4 using Microelectrodes. Part 1. 1:1 AlCl3‐LiAlH4.},
  author={Jonathan N. Howarth and Derek Pletcher},
  year={1987}
}
  • Jonathan N. Howarth, Derek Pletcher
  • Published 1987
  • Chemistry
  • Electrodeposition of Al from 0.5 M AlCl3/0.5 M LiAlH4 in THF has been investigated by potential-sweep and potential-step experiments at Au-microdisc electrodes. 

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