Alternating phase shift mask architecture scalability, implementations, and applications for 90-nm and 65-nm technology nodes and beyond

@inproceedings{Cheng2003AlternatingPS,
  title={Alternating phase shift mask architecture scalability, implementations, and applications for 90-nm and 65-nm technology nodes and beyond},
  author={Wen-Hao Cheng and Kishore K. Chakravorty and Jeff N. Farnsworth},
  booktitle={Photomask Japan},
  year={2003}
}
Alternating phase shift mask (altPSM) as a strong resolution enhancement technique is increasingly required to meet the tighter lithographic requirements on gate critical dimension (CD) control, depth of focus and low k1 applications in full chip patterning of logic and memory devices. While the frequency doubling mechanism of altPSM benefits the quality of imaging, the inherent intensity asymmetry between phase shifters, or image imbalance, causes line shift. The effect of mask topography on… CONTINUE READING

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