• Corpus ID: 203266747

Alignment-tolerant taper design for transfer printed III-V-on-Si devices

@inproceedings{Haq2019AlignmenttolerantTD,
  title={Alignment-tolerant taper design for transfer printed III-V-on-Si devices},
  author={Bahawal Haq and Gunther Roelkens},
  year={2019}
}

• B. Haq, G. Roelkens
• Published 2019
• Materials Science

In this paper, we present the design of a 1.0 m misalignment-tolerant taper for the evanescent coupling of light in a III-V-on-silicon opto-electronic device realized on an SOI waveguide platform with 400 nm thick Si device layer. The designed taper is also fabrication tolerant and is suitable for the transfer-printing-based integration of pre-processed III-V devices on Si photonics waveguide circuits. The design procedure is flexible and can take into account the limitations in critical dimensions imposed by the fabrication process.