Achievements and Perspectives of the Drie Technology for the Microsystems Market

@article{Puech2007AchievementsAP,
  title={Achievements and Perspectives of the Drie Technology for the Microsystems Market},
  author={M. Puech and J. M. Thevenoud and J. M. Gruffat and N. Launay and P. Godinat and O. Le Barillec},
  journal={TRANSDUCERS 2007 - 2007 International Solid-State Sensors, Actuators and Microsystems Conference},
  year={2007},
  pages={77-80}
}
This paper presents the evolution of the DRIE of silicon over the last decade. Starting with the initial MEMS product requirements, the DRIE demonstrated its potential to improve the delivered performances in line with the evolution of the Microsystems requirements. In less than a decade, the DRIE etching rate and aspect ratio have been multiplied by an impressive factor of 10. This outstanding capabilities favored its adoption in new microelectronic applications which lead to a step forward in… CONTINUE READING