A universal method for depositing patterned materials in situ

@article{Chen2020AUM,
  title={A universal method for depositing patterned materials in situ},
  author={Yifan Chen and Siu Fai Hung and W. K. Lo and Yang Chen and Yang Shen and Kim Kafenda and Jia Su and K. Xia and Sen Yang},
  journal={Nature Communications},
  year={2020},
  volume={11}
}
Current techniques of patterned material deposition require separate steps for patterning and material deposition. The complexity and harsh working conditions post serious limitations for fabrication. Here, we introduce a single-step and easy-to-adapt method that can deposit materials in-situ. Its methodology is based on the semiconductor nanoparticle assisted photon-induced chemical reduction and optical trapping. This universal mechanism can be used for depositing a large selection of… Expand

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