A unified method for finding approximations to impurity profiles from a two-step diffusion process

@inproceedings{Wang1983AUM,
  title={A unified method for finding approximations to impurity profiles from a two-step diffusion process},
  author={Way-Seen Wang},
  year={1983}
}
A unified method, based on some simple ideas, for finding approximations to impurity profiles from a two-step diffusion process is presented. The approximate profiles are simple and accurate enough for the evaluation of device fabrication parameters, such as junction depth, sheet resistance, total number of impurities, etc. 

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