A structure zone diagram including plasma-based deposition and ion etching

@inproceedings{Anders2010ASZ,
  title={A structure zone diagram including plasma-based deposition and ion etching},
  author={Andr{\'e} Anders},
  year={2010}
}
An extended structure zone diagram is proposed that includes energetic deposition, characterized by a large flux of ions typical for deposition by filtered cathodic arcs and high power impulse magnetron sputtering. The axes are comprised of a generalized homologous temperature, the normalized kinetic energy flux, and the net f ilm thickness, which can be negative due to ion etching. It is stressed that the number of primary physical parameters affecting growth by far exceeds the number of… CONTINUE READING
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