A simple mask aligner and printing frame for conformable photomask lithography

@article{Smilowitz1980ASM,
  title={A simple mask aligner and printing frame for conformable photomask lithography},
  author={Bernard Smilowitz and R. J. Lang},
  journal={IEEE Transactions on Electron Devices},
  year={1980},
  volume={27},
  pages={2165-2167}
}
Conformable photomask lithography allows submicrometer lines to be replicated by contact printing. Surface acoustic wave devices with 0.4-µm lines have been produced using this technique. A mask aligner and printing frame have been designed which feature micrometer controlledXandYmotion, rotation about the center of the viewing field, and both top and bottom illumination of mask and substrate. The construction and use of the apparatus, which is based on a toolmaker's microscope, is fully… CONTINUE READING

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