A simple approach to atom probe sample preparation by using shadow masks.

Abstract

Here, we present a new method that utilises shadow masks in a broad ion beam system to prepare atom probe samples. It is particularly suited to non-conductors and materials with surface layers such as surface oxides, implanted layers or thin films. This new approach bypasses the focused ion beam (FIB) lift-out step, increasing the sample throughput… (More)
DOI: 10.1016/j.ultramic.2015.09.005

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Cite this paper

@article{Felfer2016ASA, title={A simple approach to atom probe sample preparation by using shadow masks.}, author={Peter Johann Felfer and Ingrid McCarroll and Chandra Macauley and Julie Marie Cairney}, journal={Ultramicroscopy}, year={2016}, volume={160}, pages={163-167} }