A preliminary study on sputtered-deposited ruthenium thin films

@inproceedings{Rigato2005APS,
  title={A preliminary study on sputtered-deposited ruthenium thin films},
  author={Valentino Rigato and Valentina Mattarello and Silvio Restello and Franco Rigato and Piergiorgio Nicolosi and Maria Guglielmina Pelizzo},
  year={2005}
}
Metallic ruthenium thin films have attracted growing attention for various application in IC technology. Ruthenium metal having low resistivity and high purity, is a candidate material for capacitor electrodes in dynamic and ferroelettric random access memories (DRAMs and FRAMs); as gate metal, due to its relatively high work function, in future MOSFETs and as magnetic layers in ferromagnetic random access memories [1] In recent years metallic ruthenium has been investigated for application in… CONTINUE READING

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