A novel submicron fabrication technique

Abstract

A novel technique for producing submicron linewidths and devices has been developed. The technique does not require electron beam or other exotic lithographic techniques, but instead uses conventional photolithography and a selective edge planing step. In this step, a metal is plated to the edge of a conventionally patterned metal layer. This plated edge is… (More)

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Cite this paper

@article{Jackson1979ANS, title={A novel submicron fabrication technique}, author={T. N. Jackson and N. A. Masnari}, journal={1979 International Electron Devices Meeting}, year={1979}, pages={58-61} }