A novel fabrication process for ultra-sharp, high-aspect ratio nano tips using (111) single crystalline silicon

Abstract

This paper presents a novel fabrication process for ultra-sharp nano tips on cantilevers with the radius of curvature of less than 10 nm using an (111) single crystalline silicon wafer. The nano tip height 15 /spl mu/m, and the aspect ratio is greater than 3:1. The cone angle of the tip is 19.5/spl deg/. Fabrication process is based on newly obtained etch… (More)

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