A method for simulating Atomic Force Microscope nanolithography in the Level Set framework

Abstract

During the last decades it has been shown that the Atomic Force Microscope (AFM) can be used in noncontact mode as an efficient lithographic technique capable of manufacturing nanometer sized devices on the surface of a silicon wafer. The AFM nanooxidation approach is based on generating a potential difference between a cantilever needle tip and a silicon… (More)

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