A low dielectric study on hybrid plasma-polymer thin films of different ratio between toluene and TEOS.

Abstract

Organic-inorganic hybrid co-polymer thin films were deposited on silicon(100) substrates under the several ratio of TEOS (tetraethoxysilane) against toluene by plasma enhanced chemical vapour deposition (PECVD) method. Toluene and TEOS were utilized as organic and inorganic precursors each, and hydrogen and argon were also used as a bubbler and carrier… (More)

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Cite this paper

@article{Cho2011ALD, title={A low dielectric study on hybrid plasma-polymer thin films of different ratio between toluene and TEOS.}, author={S. J. Cho and D. Jung and J. H. Boo}, journal={Journal of nanoscience and nanotechnology}, year={2011}, volume={11 6}, pages={5323-7} }