A buffered distributed spray MOCVD reactor design

  • Shaolin Hu, Zhiyin Gan, Han Yan, Sheng Liu
  • Published 2012 in
    2012 13th International Conference on Electronic…


We have developed a novel MOCVD reactor, which is called buffered distributed spray (BDS) MOCVD reactor, for the multiple wafer growth of films of III-V materials. In the present study, a fundamental and multi-field model based on the computational fluid dynamic (CFD) simulation of coupled flow, heat and mass transfer is presented to describe the epitaxial… (More)


Cite this paper

@article{Hu2012ABD, title={A buffered distributed spray MOCVD reactor design}, author={Shaolin Hu and Zhiyin Gan and Han Yan and Sheng Liu}, journal={2012 13th International Conference on Electronic Packaging Technology & High Density Packaging}, year={2012}, pages={986-989} }