A Study of Molecular Orientation Effect in Photoresist Films

@article{Kaneyama2007ASO,
  title={A Study of Molecular Orientation Effect in Photoresist Films},
  author={Kei Kaneyama and Mitsue J. Toriumi and Toshiro Itani},
  journal={2007 Digest of papers Microprocesses and Nanotechnology},
  year={2007},
  pages={88-89}
}
In this paper, an investigation is made focusing on the molecular orientation in the resist film, the understanding and control of which will be very significant in the research and development of EUV resists. Molecular orientation can be investigated through fluorescence spectrometry. Based on the results, high viscosity resist solutions showed strong… CONTINUE READING