A Short History of Atomic Layer Deposition: Tuomo Suntola's Atomic Layer Epitaxy

@inproceedings{Puurunen2014ASH,
  title={A Short History of Atomic Layer Deposition: Tuomo Suntola's Atomic Layer Epitaxy},
  author={Riikka L Puurunen},
  year={2014}
}
Atomic layer deposition (ALD) is a thin film growth technique based on the repeated use of separate, saturating gas-solid reactions. The principle of ALD has been discovered twice; in the 1960s under the name “molecular layering” in the Soviet Union, and in the 1970s under the name “atomic layer epitaxy” (ALE) in Finland. In 2014, it is forty years since the filing of the worldwide patent on ALE as a method for the growth of compound thin films. This essay celebrates the fortieth anniversary of… CONTINUE READING

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