A Phasor and Particle Model for Coupling between an Auto-Matching Network and Electrical Plasma

  • D. T. K. Kwok
  • Published 2007 in
    2007 IEEE 34th International Conference on Plasma…

Abstract

Summary form given only. In most of the semiconductor fabrication processes such as plasma doping, plasma-enhanced chemical vapor deposition, and plasma etching, electrical plasma (ions and electrons) are involved. To generate the plasma, it is common to use radio-frequency (RF) coupled inductive or capacitive discharge with an external matching network… (More)

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