Corpus ID: 233033553

A Novel Approach for Semiconductor Etching Process with Inductive Biases

@article{Myung2021ANA,
  title={A Novel Approach for Semiconductor Etching Process with Inductive Biases},
  author={Sanghoon Myung and Hyunjae Jang and Byungseon Choi and Jisu Ryu and Hyuk Kim and Sang Wuk Park and C. Jeong and Dae Sin Kim},
  journal={ArXiv},
  year={2021},
  volume={abs/2104.02468}
}
The etching process is one of the most important processes in semiconductor manufacturing. We have introduced the state-of-the-art deep learning model to predict the etching profiles. However, the significant problems violating physics have been found through various techniques such as explainable artificial intelligence and representation of prediction uncertainty. To address this problem, this paper presents a novel approach to apply the inductive biases for etching process. We demonstrate… Expand

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