A Low-Frequency Infrared Study of the Reaction of Methoxymethylsilanes with Silica.

@article{White2000ALI,
  title={A Low-Frequency Infrared Study of the Reaction of Methoxymethylsilanes with Silica.},
  author={White and Tripp},
  journal={Journal of colloid and interface science},
  year={2000},
  volume={224 2},
  pages={417-424}
}
  • White, Tripp
  • Published 2000 in Journal of colloid and interface science
A thin film infrared technique is used to observe bands due to hydrogen-bonded and chemisorbed methoxymethylsilanes on fumed silica in the low-frequency region below 1300 cm(-1). The low-frequency region contains the characteristic bands due to Si-O-Si, Si-O, Si-C, Si-CH(3), and SiO-C modes. Band assignments are aided by ab initio calculations and… CONTINUE READING