A 32-site Neural Recording Probe Fabricated by Double-Sided Deep Reactive Ion Etching of Silicon-on-Insulator Substrates

Abstract

A neural probe with a 32-site electrode array was fabricated using an all-dry Si etch based micromachining process. The fork-like probe shafts were formed by double-sided deep reactive ion etching (DRIE) of a silicon-on-insulator (SOI) substrate, with the buried SiO2 layer acting as an etch stop. The shafts typically had the dimensions 5 mm x 25 μm x 20 μm… (More)

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