3D feature profile simulation based on realistic surface kinetic studies of silicon dioxide etch process in fluorocarbon plasmas

@inproceedings{Chang20123DFP,
  title={3D feature profile simulation based on realistic surface kinetic studies of silicon dioxide etch process in fluorocarbon plasmas},
  author={Won-Seok Chang and Dong-Hun Yu and Deog-Gyun Cho and Yeong-Geun Yook and Poo-Reum Chun and Se-A Lee and Deuk-Chul Kwon and Mi-Young Song and Jung-Sik Yoon and Yeon-Ho Im},
  year={2012}
}