157-nm coherent light source as an inspection tool for F(2) laser lithography.

@article{Suganuma2002157nmCL,
  title={157-nm coherent light source as an inspection tool for F(2) laser lithography.},
  author={Takashi Suganuma and Hidetoshi Kubo and Osamu Wakabayashi and Hakaru Mizoguchi and Kiyoharu Nakao and Yasuo Nabekawa and Tadashi Togashi and Shuntaro Watanabe},
  journal={Optics letters},
  year={2002},
  volume={27 1},
  pages={46-8}
}
We have developed a 157-nm coherent light source by two-photon resonant four-wave mixing in Xe, with two tunable single-mode 1-kHz Ti:sapphire laser systems at 768 and 681 nm. This light source has been developed to determine the instrumental function of a vacuum ultraviolet spectrometer and to evaluate optical designs for ultra-line-narrowed F(2) laser lithography. The spectral linewidth of the source was less than 0.008 pm (FWHM), with an average power of 0.6 mW. 

From This Paper

Topics from this paper.
8 Citations
0 References
Similar Papers

Citations

Publications citing this paper.
Showing 1-8 of 8 extracted citations

Similar Papers

Loading similar papers…