[Optical emission analyses of N2/TMG ECR plasma for deposition of GaN film].

@article{Fu2013OpticalEA,
  title={[Optical emission analyses of N2/TMG ECR plasma for deposition of GaN film].},
  author={Si-Lie Fu and Chun-an Wang and Jun-fang Chen},
  journal={Guang pu xue yu guang pu fen xi = Guang pu},
  year={2013},
  volume={33 4},
  pages={1108-11}
}
The optical emission spectroscopy of hybrid N2/trimethylgallium (TMG) plasma in an ECR-PECVD system was investigated. The results indicate that the TMG gas is strongly dissociated into Ga*, CH and H even under self-heating condition. Ga species and nitrogen molecule in metastable state are dominant in hybrid ECR plasma. The concentration of metastable… CONTINUE READING