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In recent years, a variety of film thickness measurement techniques for copper chemical mechanical planarization (CMP) are subsequently proposed. In this paper, the eddy-current technique is used. In the control system of the CMP tool developed in the State Key Laboratory of Tribology, there are in situ module and off-line module for measurement subsystem.(More)
Pulsed eddy current (PEC) method for thickness measurement of metal film has been widely investigated in recent years. In the previous researches, this method has been mainly used in metal thickness measurement in the range from millimeter to centimeter and nondestructive inspection. The effectiveness of the PEC method for measurement of submicrometer thick(More)
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