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Two novel uranyl coordination polymers, namely, UO2(bptc)(H(2)bpy)center dot(bpy) (1) and (UO2)(3)(bptc)(1.5)(phen)(2)(H2O)(2)center dot H2O (2) (H(4)bptc = 3,3',4,4'-benzophenonetetracarboxylic… (More)
We report the effect of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition for moisture barrier applications. The Al2O3 films were grown… (More)
We report for the first-time batch process of atomic layer deposition (ALD) for aluminum nitride (AlN). Ammonia (NH3) was used as the nitrogen source, while trimethylaluminum (TMA) or aluminum… (More)
Abstract In this study, a novel core–shell Pt@NiO-based hydrogen gas sensor was investigated. Core–shell Pt@NiO was prepared through the sol-gel method, and the sensor device was fabricated by… (More)
In this work, we report the successful growth of high-quality SiO2 films by low-temperature plasma-enhanced atomic layer deposition using an oxidant which is compatible with moisture/oxygen sensitive… (More)