Yoshihito Kobayashi

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Now a day, focused ion beam (FIB) systems equipped with a gallium liquid metal ion source (Ga-LMIS) have been used in the wide areas, e.g., photo-mask repair for semiconductor devices, micro-fabrication for MEMS, sample preparation for TEM and so on. However, contaminations by the irradiated gallium ions are severe problems in these applications, thus for(More)
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