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Optimal coherent decompositions for radially symmetric optical systems
In this article, we discuss the application of the optimal coherent decompositions introduced by Pati and Kailath [J. Opt. Soc. Am. A 11, 2438 (1994)] to radially symmetric optical systems. We showExpand
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Subwavelength optical lithography: challenges and impact on physical design
We review the implications of subwavelength optical lithography for new tools and ows in the interface between layout design and manufacturability. After discussing the necessity of corrections forExpand
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Subwavelength lithography and its potential impact on design and EDA
This tutorial paper surveys the potential implications of subwavelength optical lithography for new tools and flows in the interface between layout design and manufacturability. We review control ofExpand
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Prevention and treatment of urinary tract infection with probiotics: Review and research perspective
The spiralling costs of antibiotic therapy, the appearance of multiresistant bacteria and more importantly for patients and clinicians, unsatisfactory therapeutic options in recurrent urinary tractExpand
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Depth of focus and the moment expansion.
We introduce the so-called moment expansion of a defocused image as a tool for analyzing and improving the depth of focus in optical imaging. It is shown that a number of previously noted defocusExpand
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Application of alternating phase-shifting masks to 140-nm gate patterning: linewidth control improvements and design optimization
In this paper we show that the problem of intrafield line width variations can be effectively solved through a novel application of alternating phase-shifting mask (PSM) technology. To illustrate itsExpand
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Application of alternating phase-shifting masks to 140-nm gate patterning: II. Mask design and manufacturing tolerances
In this paper we present the results of experimental patterning 140 nm poly gates with double-exposure alternating phase-shifting masks (PSM) using a Nikon EX-1 (KrF, 0.42NA) stepper. We show that:Expand
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2×2 Phase Mask for Arbitrary Pattern Formation
The phase-shifting mask (PSM) extends the resolution limit of optical lithography. The major hurdle to the widespread use of PSMs is that high resolution can be obtained only for the limited patternExpand
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Wavelet based identification of a flexible structure with surface mounted smart actuators and sensors
Y.C. Pati (1992) developed the theory of rational wavelets for the purpose of system identification. We use this theory in order to study the identification problem of a flexible beam with bondedExpand
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