Xisheng Guo

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A quantitative understanding of yield response to water and nutrients is key to improving the productivity and sustainability of rainfed cropping systems. Here, we quantified the effects of rainfall, fertilization (NPK) and soil organic amendments (with straw and manure) on yields of a rainfed wheat-soybean system in the North China Plain (NCP), using(More)
Articles you may be interested in Bandgap measurements of low-k porous organosilicate dielectrics using vacuum ultraviolet irradiation Appl. The effect of water uptake on the mechanical properties of low-k organosilicate glass Mechanism of plasma-induced damage to low-k SiOCH films during plasma ashing of organic resists Plasma damage effects on low-k(More)
Soil organic carbon (SOC) sequestration is important for improving soil fertility of cropland and for the mitigation of greenhouse gas emissions to the atmosphere. The efficiency of SOC sequestration depends on the quantity and quality of the organic matter, soil type, and climate. Little is known about the SOC sequestration efficiency of organic amendments(More)
The effects of cesium (Cs) ion-implantation on uncured and ultraviolet (UV)-cured plasma-enhanced chemical-vapor-deposited (PECVD) organosilicate low dielectric constant (low-k) (SiCOH) films have been investigated. The mechanical properties, including the elastic modulus and hardness, of the SiCOH low-k films are improved by up to 29.9% with Cs(More)
Articles you may be interested in Effects of vacuum ultraviolet irradiation on trapped charges and leakage currents of low-k organosilicate dielectrics Appl. Bandgap measurements of low-k porous organosilicate dielectrics using vacuum ultraviolet irradiation Appl. Influence of electron-beam and ultraviolet treatments on low-k porous dielectrics
Articles you may be interested in Effect of vacuum-ultraviolet irradiation on the dielectric constant of low-k organosilicate dielectrics Appl. Bandgap measurements of low-k porous organosilicate dielectrics using vacuum ultraviolet irradiation Appl. The effects of plasma exposure and vacuum ultraviolet irradiation on photopatternable low-k dielectric(More)
In order to test the efficacy of conservation tillage and optimized fertilization on reducing N and P runoff losses, a 4-year (2007–2011) runoff plot experiment was conducted in the Chaohu Lake region, East China. There were four treatments including: (1) conventional tillage (CT, basal fertilization without mulch), (2) conventional tillage with straw(More)
More and more high-and low-k dielectrics are used in microfabrication today. However, as is well known, these materials are easily damaged during processing or during operation in a device. Sources of damage include plasma and/or VUV exposure, water uptake, free radicals as well as cosmic rays. A description of the damage effects on dielectrics from water(More)
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