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Hybrid reconfigurable logic circuits were fabricated by integrating memristor-based crossbars onto a foundry-built CMOS (complementary metal-oxide-semiconductor) platform using nanoimprint lithography, as well as materials and processes that were compatible with the CMOS. Titanium dioxide thin-film memristors served as the configuration bits and switches in(More)
We introduce the concept of wafer bowing to affect nanoimprinting. This approach allows a design that can fit the key imprinting mechanism into a compact module, which we have constructed and demonstrated with an overlay and resolution of <0.5 microm and <10 nm, respectively. In the short term, this wafer bowing approach makes nanoimprint lithography much(More)
Atomic force microscopy and x-ray diffractometry were used to study 1500 A-thick films of pure C(60) grown by sublimation in ultrahigh vacuum onto a CaF(2) (111) substrate. Topographs of the films did not reveal the expected close-packed structures, but they showed instead large regions that correspond to a face-centered cubic (311) surface and distortions(More)
We report here plasma-induced formation of Ag nanostructures for surface-enhanced Raman scattering (SERS) applications. An array of uniform Ag patterned structures of 150 nm diameter was first fabricated on a silicon substrate with imprint lithography; then the substrate was further treated with an oxygen plasma to fracture the patterned structures into(More)
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