W. Bachtold

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—Genetic and simplex-downhill (SD) algorithms were used for the optimization of the electron-beam lithography (EBL) step in the fabrication of microwave electronic circuits. The definition of submicrometer structures involves complex exposure patterns that are cumbersome to determine experimentally and very difficult to optimize with linear search(More)
air hole array of a triangular lattice in an alumina matrix. For the formation of a fluorescent-dye layer on the surface of porous alumina, the porous alumina substrate was dipped in an ethanol solution containing 20 wt.-% dendrimer [13] and 4 × 10 –3 M pyrromethene 597 (EXITON) for 1 min and then dried. The thickness of the fluorescent dye layer was(More)
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