Vu Thi Kim Oanh

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This article reports the effects of nanometer surface roughness on the magnetic properties of CoFeHfO thin films, as deposited on Si (100) substrates. The surface roughness was controlled via the working pressure during the sputtering time. When the working pressure increases from 0.5 to 3 mT, the surface roughness (R) of CoFeHfO thin films, formed by(More)
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