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- Publications
- Influence
0.30k1 CH delineation with novel image reversal materials
- J. Hatakeyama, Kazuhiro Katayama, T. Yoshihara, Y. Kawai, Toshinobu Ishihara
- Materials Science, Engineering
- Advanced Lithography
- 13 March 2009
Resolution enhancement by novel image reversal (RENOIR) process and materials are studied for shrinkage of hole size and pitch. The process approach is based on formation of pillar pattern and its… Expand
Special articles on new aspects of silicon chemistry. Biological activity of organo silicon compounds. Study on cancer chemotherapeutic activity.
- H. Fujita, K. Fukushima, +7 authors Toshinobu Ishihara
- Chemistry
- 1990
有… Expand
Investigation of Discrimination Enhancement with New Modeling for Poly-Hydroxystyrene Positive Resists
- J. Hatakeyama, S. Nagura, Toshinobu Ishihara
- Materials Science
- 2000
Discrimination enhancement of poly-hydroxystyrene based chemically amplified positive resists was investigated with acid and base neutralization model in Eq. 8. Relationship of deprotecting… Expand
Development of Silicon Containing Resists for sub-100nm Lithography
- J. Hatakeyama, T. Takeda, M. Nakashima, Takeshi Kinsho, Y. Kawai, Toshinobu Ishihara
- Materials Science
- 2004
Polysilsesquioxane (SSQ) and alternating-copolymers of silicon containing olefin with maleic anhydride (SiMA) have been employed as backbone polymers of silicon containing bilayer resists. Several… Expand
Newly developed alternating-copolymer-based silicon containing resists for sub-100-nm pattern fabrication
- J. Hatakeyama, T. Takeda, T. Kinsho, Y. Kawai, Toshinobu Ishihara
- Materials Science, Engineering
- SPIE Advanced Lithography
- 11 June 2003
Silicon containing bi-layer resist systems for 193nm lithography have been developed for sub-100nm pattern fabrication. Lithographic characteristics of thin film top layer resist show the advantages… Expand
Novel Synthesis of Dienones and Enones from Propargyl Alcohols and Allyl Alcohols with 2,2-Dimethoxypropane: Synthesis of Ionone and Irone
- Toshinobu Ishihara, T. Kitahara, M. Matsui
- Chemistry
- 1 February 1974
A new synthetic procedure for dienone derivatives, i.e., ionone and irone, is described. The key step is the pyrolytic rearrangement of allyl alcohols and 2,2-dimethoxypropane in the presence of an… Expand
3-Thienylsiliziumverbindungen, therefrom shaped, ultra-thin, chemically adsorbed film and method of producing the
- N. Mino, Kazufumi Ogawa, Toshinobu Ishihara, Mikio Endo, Tohru Kubota, K. Asakura
- Materials Science
- 9 September 1993
Discrimination enchancement in polysilsesquioxane-based positive resists for ArF lithography
- J. Hatakeyama, M. Nakashima, Isao Kaneko, S. Nagura, Toshinobu Ishihara
- Materials Science, Engineering
- Advanced Lithography
- 29 June 1998
In order to establish surface imaging process using O2- RIE on ArF lithography, silicon containing bi-layer resists have been investigated. We synthesized cyclohexyl pendant silsesquioxane polymer to… Expand
(2-phenylpropan-2-yl) silane compounds and a process for their preparation
- Toshinobu Ishihara, Minoru Takamizawa, Mikio Endo, T. Kubota
- Chemistry
- 28 August 1987
Investigation of discrimination enhancement in polysilsesquioxane based positive resist for ArF lithography
- J. Hatakeyama, M. Nakashima, I. Kaneko, S. Nagura, Toshinobu Ishihara
- Chemistry
- 1998
In order to establish surface imaging process using O 2 -RIE on ArF lithography, silicon containing bi-layer resists have been investigated. We synthesized cyclohexyl pendant silsesquioxane polymer… Expand