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0.30k1 CH delineation with novel image reversal materials
Resolution enhancement by novel image reversal (RENOIR) process and materials are studied for shrinkage of hole size and pitch. The process approach is based on formation of pillar pattern and itsExpand
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Investigation of Discrimination Enhancement with New Modeling for Poly-Hydroxystyrene Positive Resists
Discrimination enhancement of poly-hydroxystyrene based chemically amplified positive resists was investigated with acid and base neutralization model in Eq. 8. Relationship of deprotectingExpand
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Development of Silicon Containing Resists for sub-100nm Lithography
Polysilsesquioxane (SSQ) and alternating-copolymers of silicon containing olefin with maleic anhydride (SiMA) have been employed as backbone polymers of silicon containing bilayer resists. SeveralExpand
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Newly developed alternating-copolymer-based silicon containing resists for sub-100-nm pattern fabrication
Silicon containing bi-layer resist systems for 193nm lithography have been developed for sub-100nm pattern fabrication. Lithographic characteristics of thin film top layer resist show the advantagesExpand
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Novel Synthesis of Dienones and Enones from Propargyl Alcohols and Allyl Alcohols with 2,2-Dimethoxypropane: Synthesis of Ionone and Irone
A new synthetic procedure for dienone derivatives, i.e., ionone and irone, is described. The key step is the pyrolytic rearrangement of allyl alcohols and 2,2-dimethoxypropane in the presence of anExpand
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Discrimination enchancement in polysilsesquioxane-based positive resists for ArF lithography
In order to establish surface imaging process using O2- RIE on ArF lithography, silicon containing bi-layer resists have been investigated. We synthesized cyclohexyl pendant silsesquioxane polymer toExpand
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Investigation of discrimination enhancement in polysilsesquioxane based positive resist for ArF lithography
In order to establish surface imaging process using O 2 -RIE on ArF lithography, silicon containing bi-layer resists have been investigated. We synthesized cyclohexyl pendant silsesquioxane polymerExpand