Tino Benkenstein

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A wafer-to-wafer inspection of microsystems is a promising approach for a parallel and thus high speed characterization in particular for MEMS and MOEMS. The probing wafers aligned above the M(O)EMS wafer consists of arrays of micro-optical interferometers for the shape-, deformation-, resonance-characterization. In this contribution we show that binary(More)
Grating waveguide structures have been prepared by the deposition of a high refractive index broadband antireflection coating onto a patterned fused silica substrate. Aluminum oxide and hafnium oxide as well as mixtures thereof have been used as coating materials. Optical reflection measurements combined with atomic force microscopy have been used to(More)
We designed, fabricated, and characterized three-level transmission gratings in the resonance domain with reduced shadowing losses based on a three-wave interference mechanism. A new technological approach allows for fabrication of homogeneous and large area multilevel gratings without spurious artifacts. To our knowledge, the measured efficiency of 86%(More)
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