Tangyou Sun

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Position-configurable, reproducible, vertically aligned nanosheets assemblies (ANAs) arrays are fabricated by polymer-templated electrodeposition method at room temperature. Here, nanoimprint lithography is utilized to fabricate polymer template on the fluorine-doped tin oxide substrate for the purpose of evenly tuning the location of Ag nanostructures.(More)
In order to control nanoimprint lithography processes to achieve good fidelity, accurate characterization of structural parameters of nanoimprinted resist patterns is highly desirable. Among the possible techniques, optical scatterometry is relatively ideal due to its high throughput, low cost, and minimal sample damage. Compared with conventional optical(More)
In this paper, a 2 inch random nanohole Si template with hole diameter of 36-97 nm is employed for direct tailoring the Si substrate for antireflection. The random nanohole Si template is fabricated from the natural self-organization process and can be used repeatedly in nanoimprint lithography (NIL). The surface roughness induced from the nanohole(More)
We demonstrate the spectral beam combining of a diode laser stack, which contains three 970nm Mini-Bars along the fast-axis direction, in an external cavity. At the pump current of 60 A, the output power of 127 W, the spectral bandwidth of 12 nm and the Electro-optical conversion efficiency of 48.35% are achieved. The measured beam qualities after the(More)
Nanoimprint lithography (NIL), as a promising next generation lithography method, has the advantages of high throughput, sub-10-nm feature and low cost. However, the requirements, such as the structure with high aspect ratio, large area uniformity, and pattern transfer on nonflat surface, have barely been satisfied at the same time. In this study, the(More)
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