The review concentrates on the analysis of the RF hydrogen plasma effect on thin-film metal-dioxide-silicon and silicon-dioxide silicon structures which are a modern basis of microand… (More)
RF hydrogen plasma treatment, rapid thermal annealing and thermal annealing of high-dose implanted amorphized p-type Ge layers have been studied by Raman scattering spectroscopy, AFM, SIMS and… (More)
This work describes emission properties of a new nanostructured material which is carbon-rich amorphous (a) SiC deposited on silicon wafer. Even non-optimized technology demonstrates that the field… (More)