T Vijaykumar

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Electron beam induced carbonaceous deposition has been carried out in the presence of water vapor at 0.4 torr pressure amidst residual hydrocarbons present in the SEM chamber. When performed at a CNT location on a Si substrate with low e beam energy (10 kV), the deposition was taking place beneath the CNT. While higher beam energy (25 kV) causing the(More)
Nanopatterning of Si(100) surfaces deposited with Au films from physical and chemical methods, has been carried out using a AFM set up mounted with a conducting tip. At a tip bias of -12 V, the LAO patterns drawn on various Au/SiOx surfaces have been compared with those on bare Si. The height of the oxide patterns is several times higher in the case of Au(More)
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