T. Makigaki

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We dev eloped the dep osition-mask to apply MEMS techn olog y and the mask-de positio n technology to pattern fine precise electric circuits. As the mask was fabricated to from a dry-et ching proc ess using the De ep-Si-RIE and a wet-etching pro cess, this mask can pattern fine precision electric circuits. We also dev eloped ma sk contact tech nolo gy that(More)
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