T. E. Stapinski

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Hydrogenated amorphous silicon-nitrogen (a-Si/sub 1-x/N/sub x/:H) thin films are interesting for optoelectronic applications. The optical gap of this material varies in the range from 1.8 to 3 eV depending mainly on the nitrogen content. The electronic, optical and structural properties are influenced by the technological parameters. The authors deposited(More)
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