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This paper describes the process of narrow band pulsed electric fields (NPEFs) and its effect on mammalian cells. The NPEF consists of a pulse modulated sinusoidal wave (PMSW), which allows delivery of well-defined electric fields in terms of frequency, field strength and deposition energy to the biological systems. 100 μs long sinusoidal electric fields(More)
—A magnetic pulse compressor (MPC) was used to control the exhaust gases from a diesel generator employing a wire-to-plate plasma reactor in this work. To obtain efficient NO X removal, the energy transfer efficiency from the MPC to the plasma reactor and the pulse streamer discharge physics were investigated by varying the number of anode wires and(More)
This paper details the construction of a sub-nanosecond pulse generator capable of delivering 250 kV into a high impedance load. The pulse width is approximately 600ps with a voltage rise of up to 1 MV/ns. The pulse rise-time can be adjusted by manipulation of a peaking gap, whereas the pulse-width can be changed by adjusting a novel tail-cut switch located(More)
A low inductance circuit has been fabricated in order to obtain shorter time to saturation during core unsaturation and current pulses with shorter widths during core saturation. B-H curves have been derived from the measured voltage and current waveforms. Characteristics of the magnetic core for pulsed-power generators have been investigated and the(More)
Collective laser Thomson scattering (LTS) has been successfully applied to Z-pinched plasmas produced for extreme ultraviolet (EUV) light sources. Results of measurements gave plasma parameters just after the pinch as the electron density n e =1.5×10 24 m-3 , the electron temperature T e =15 eV, and the averaged ionic charge Z =7. Furthermore, based on(More)
Xenon capillary discharge sources are being developed for extreme ultraviolet (EUV) light for next generation lithography. However, the current sources generate in-band (2%), 2pi EUV emission with conversion efficiency (CE) of <1%. Here we report progress in the development of a Z-pinch EUV source using a tin target, which was found to have significant(More)
Extreme ultraviolet (EUV) radiation with wavelengths of 11-14 nm is seen as the most promising candidate for a new lithographic technology. Compared with synchrotron radiation sources and laser-produced plasmas, gas discharge-produced plasma sources for EUV radiation are expected to offer lower cost of ownership. Using xenon, a broadband emission in the(More)
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