Sun-Woo Moon

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  • Jun-Hong Jeon, Jin-Young Choi, +4 authors Seung-Hee Han
  • Nanotechnology
  • 2011
A new plasma process, i.e. a combination of plasma immersion ion implantation and deposition (PIII&D) and high power impulse magnetron sputtering (HiPIMS), was developed to implant non-gaseous ions into material surfaces. The new process has the great advantage that thin film deposition and non-gaseous ion implantation can be achieved in a single plasma(More)
A new plasma process, i.e., combination of PIII&D(Plasma Immersion Ion Implantation and Deposition) and HiPIMS(HIgh Power Impulse Magnetron Sputtering), was developed to implant non-gaseous ions into materials surface. The new process has great advantage that thin film deposition and non-gaseous ion implantation can be achieved in a single plasma(More)
The NbN films were deposited on Co-Cr alloy using Plasma Immersion Ion Implantation & Deposition (PIII&D) technique, which enabled the simultaneous modification of the growing films by ion bombardment during deposition. We performed nitrogen ion implantation on Co-Cr alloy prior to the deposition process and introduced dynamic ion mixing process in(More)
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