Suhk Kun Oh

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A GaN epilayer was grown on Al/sub 2/O/sub 3/ substrate by metal-organic chemical vapor deposition, and Co/sup -/ ions with a dose of 3/spl times/10/sup 16/ cm/sup -2/ were implanted into GaN at 350/spl deg/C. The implanted samples were postannealed at 700/spl deg/C-900/spl deg/C to recrystallize the samples and to remove implantation damage. We have(More)
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