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Journals and Conferences
We report on the absorption of a 100nm thick hydrogenated amorphous silicon layer patterned as a planar photonic crystal (PPC), using laser holography and reactive ion etching. Compared to an unpatterned layer, electromagnetic simulation and optical measurements both show a 50% increase of the absorption over the 0.38-0.75micron spectral range, in the case… (More)
InP-based square-lattice photonic crystal laser with a single air-hole defect was fabricated by a combined lithography of laser holography and focused ion beam, which enables the large scale and high throughput fabrication of PC-based devices.
We report a method of producing a lateral gradient in the optical properties of anodically etched porous silicon layers. Lateral gradation details of the porous silicon layer are governed by the etch mask pattern involved. Unlike other methods that rely on uneven hole current distribution, we believe that in our method the diffusion of reactive ions in the… (More)