Shaohai Zeng

We don’t have enough information about this author to calculate their statistics. If you think this is an error let us know.
Learn More
As IC technology continues scaling, the performance of IC chip is no longer limited to the transistor level, but the RC delays associated with the metal interconnects. To improve performance of interconnects, Cu/low-k structure was introduced to reduce the parasitic resistance and capacitance in advanced CMOS technology. But when CMOS technology is scaling(More)
  • 1