Seonghyeon Oh

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We propose a scheme of overlay alignment for plasmonic lithography using a scanning contact probe. Using two resonances of a ridge aperture in a metal film, we introduce the aperture's multifunctional characteristics for patterning and alignment at different wavelengths. To verify this idea, we measure an image of an alignment mark using a scanning ridge(More)
We report an extension of plasmonic lithography to nanoscale 2.5-dimensional (2.5D) surface patterning. To obtain the impulse response of a plasmonic lithography system, we described the field distribution of a point dipole source generated by a metallic ridge aperture with a theoretical model using the concepts of quasi-spherical waves and surface(More)
We introduce a plasmonic resonance ridge aperture capable of sensing changes in refractive index and absorption with nanoscale resolution. Using this aperture, we devised a plasmonic near-field scanning nanoscope (PNSN) to record images of heterogeneous nanostructures. Compared to a conventional near-field scanning optical microscope (NSOM) that measures(More)
A method for simply analyzing the relation between spot positions of near-field beam sources with micrometer pitch is proposed using an optical microscope. Based on the locations of spots in an optical microscopy image of lithographic patterns, the effective relative position is derived using simple linear regression. Numerical analysis is performed to(More)
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