Senajith B. Rekawa

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To extend soft x-ray microscopy to a resolution of order 10 nm or better, we developed a new nanofabrication process for Fresnel zone plate lenses. The new process, based on the double patterning technique, has enabled us to fabricate high quality gold zone plates with 12 nm outer zones. Testing of the zone plate with the full-field transmission x-ray(More)
Scanning illumination systems provide for a powerful and flexible means for controlling illumination coherence properties. Here we present a scanning Fourier synthesis illuminator that enables microfield extreme ultraviolet lithography to be performed on an intrinsically coherent synchrotron undulator beamline. The effectiveness of the system is(More)
A new generation of 0.3 numerical aperture prototype EUV optical systems is now being produced to provide an opportunity for early learning at 20-nm feature size. Achieving diffraction limited performance from these two-mirror, annular projection optics poses a challenge for every aspect of the fabrication process, including final alignment and(More)
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