Safa O. Kasap

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The pulsed PECVD involves modulation of standard 13.56 MHz RF plasma in the kHz range. This allows an increase in the electron density during the 'ON' cycle, while in the 'OFF' cycle neutralizing the ions responsible for dust formation in the plasma. In this work, we report the development of state of the art nano-crystalline Si (nc-Si:H) materials using(More)
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