S. Roth

Publications
Influence

Polysilicon encapsulated local oxidation

S. Roth, W. Ray, C. Mazure, H. C. Kirsch
Materials Science
IEEE Electron Device Letters
1 March 1991

Polysilicon encapsulated local oxidation (PELOX) is proposed as an effective isolation technique that satisfied advanced device requirements without any difficult-to-control structures or processes.… Expand

Purity Evaluation of Bulk Single Wall Carbon Nanotube Materials

U. Dettlaff-Weglikowska, J. Wang, J. Liang, B. Hornbostel, J. Čech, S. Roth
Materials Science
27 September 2005

We report on our experience using a preliminary protocol for quality control of bulk single wall carbon nanotube (SWNT) materials produced by the electric arc-discharge and laser ablation method. The… Expand

Recessed polysilicon encapsulated local oxidation

K.J. Cooper, S. Roth, W. Ray, H. C. Kirsch, J. Ko
Materials Science
IEEE Electron Device Letters
1 October 1991

Local oxidation of silicon (LOCOS) is the most commonly used isolation technology in silicon integrated circuits. The inherently large field oxide encroachment associated with LOCOS severely limits… Expand

Large-area and three-dimensional deposition of diamond-like carbon films for industrial applications

D. Roth, B. Rau, S. Roth, Joachim Mai
Materials Science
1 December 1994

Abstract Diamond-like carbon (DLC) layers have excellent mechanical properties such as high hardness, high modulus of elasticity and low friction coefficient. They show an anti-adhesive effect in… Expand

Injection moulded Si3N4 structural components

Lothar Schonfelder, S. Roth, G. Wötting, E. Gugel
Materials Science
1997

The injection moulding process as a near-net-shaping of Si 3 N 4 components has been developed to such a level that allows for the manufacture of even complexly formed components with volumes of… Expand

The Influence of Alloy Composition and Thermal Treatment on Structural and Magnetic Properties of Mechanically Alloyed Fe-Transition Metal-Based Alloys

C. Stiller, J. Eckert, S. Roth, R. Schäfer, U. Klement, L. Schultz
Materials Science
1 July 1996

The Influence of Processing Conditions on the Microstructure and the Magnetic Properties of Fe-Zr-Cu-(B)-Based Alloys Prepared by Mechanical Attrition

C. Stiller, J. Eckert, R. Schäfer, S. Roth, L. Schultz
Materials Science
1 October 1996

Patterned thick photoresist layers for protection of protruding structures during wet and dry etching processes

P.-F. Indermühle, S. Roth, L. Dellmann, N. Rooij
Chemistry, Materials Science
1 June 1998

Thick photoresist (about 40 m) was patterned and used as a protective layer for protruding structures (sharp, high aspect ratio atomic force microscope tips) in wet (buffered hydrofluoric acid) and… Expand

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