Rajesh Ramanujam

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Nickel-based super alloys are classified as 'difficult to machine' materials due to its inherent characteristics such as high hardness, and toughness, high strength at elevated temperatures, low thermal conductivity, ability to react with cutting inserts, and ability to weld onto the surface of the cutting insert. The present study investigated the(More)
The ultra-thin nickel silicide films were grown using both soak and spike anneals from temperatures from 160°C to 400°C in 10–20°C intervals as a means to characterize the low temperature annealing capabilities of our RTP system. The Rs transformation curves were generated and the resulting films were characterized by Rs and(More)
Si fluorescence or spontaneous emission was discovered during the development of lower-temperature pyrometer. To reveal unambiguously the Si spontaneous emission, a high-power 980nm laser is used together with a high sensitivity IR spectrometer. Clear Si fluorescence spectra with peaks at ∼1140nm were obtained at different Si temperatures. The Si(More)
Laser annealing is one of the process solutions to enable ultra shallow junction (USJ) formation for the 45 nm technology node. However, variations in the front-side optical properties of device wafers cause large temperature variations on the wafer surface which, in turn, cause large variations in activation of the dopants that form the junction. As a(More)
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