Rajesh Menon

Amil Patel3
Trisha L Andrew3
3Amil Patel
3Trisha L Andrew
2Fernando Bulovic
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This paper demonstrates a model for electricity delivery and revenue collection in a rural context with the potential to increase the reliability of service delivery and lower operating costs compared to traditional fixed monthly fee utilities. The microutility in this paper provides power on a pre-paid basis similar to the way cellular phone air-time is(More)
Nanolithography is the key technology driving technological progress in electronics, photonics, information technology and biotechnology. The tools and techniques used in the semiconductor industry have become too expensive for applications other than high-volume manufacturing. Masks, which are required for each unique design, can cost tens of thousands of(More)
Localization of a single fluorescent particle with sub-diffraction-limit accuracy is a key merit in localization microscopy. Existing methods such as photoactivated localization microscopy (PALM) and stochastic optical reconstruction microscopy (STORM) achieve localization accuracies of single emitters that can reach an order of magnitude lower than the(More)
Absorbance modulation is an approach that enables the localization of light to deep sub-wavelength dimensions by the use of photochromic materials. In this article, we demonstrate the application of absorbance modulation on a transparent (quartz) substrate, which enables patterning of isolated lines of width 60 nm for an exposure wavelength of 325 nm.(More)
In this Letter, we report the preliminary demonstration of a new paradigm for photovoltaic power generation that utilizes a broadband diffractive-optical element (BDOE) to efficiently separate sunlight into laterally spaced spectral bands. These bands are then absorbed by single-junction photovoltaic cells, whose band gaps correspond to the incident(More)
By saturating a photochromic transition with a nodal illumination (wavelength, λ), one isomeric form of a small molecule is spatially localized to a region smaller than the far-field diffraction limit. A selective oxidation step effectively locks this pattern allowing repeated patterning. Using this approach and a two-beam interferometer, we demonstrate(More)
We exploit the inherent dispersion in diffractive optics to demonstrate planar chromatic-aberration-corrected lenses. Specifically, we designed, fabricated and characterized cylindrical diffractive lenses that efficiently focus the entire visible band (450 nm to 700 nm) onto a single line. These devices are essentially pixelated, multi-level(More)
Absorbance-Modulation-Optical Lithography (AMOL) enables super-resolution optical lithography by simultaneous illumination of a photochromic film by a bright spot at one wavelength, λ1 and a node at another wavelength, λ2. A deep subwavelength region of the transparent photochromic isomer is created in the vicinity of the node. Light at λ1 penetrates this(More)
  • Feng Zhang, Henry I Smith, Joseph F, Nancy P Keithley, Henry, Joseph F Smith +14 others
  • 2014
The ability of electron-beam lithography (EBL) to create sub-10-nm features with arbitrary geometry makes it a critical tool in many important applications in nano-scale science and technology. The conventional EBL system is limited by its poor absolute-placement accuracy, often worse than its resolution. Spatial-phase-locked electron-beam lithography(More)
  • Rle Groups, Mark Karl K Berggren, Euclid Mondol, Mark L Moon, Schattenburg, I Henry +51 others
  • 2009
The NSL and SNL focus on developing tools and techniques for fabricating surface structures with feature sizes in the range from 1 to 100 nanometers that are beyond what is available commercially. In addition, a wide variety of research applications that employ these tools and techniques are pursued by NSL and SNL personnel, and collaborators from a variety(More)